submit news    HOME | FEEDBACK  


« NAVIGATION »
NEWS

- Bio/Medicine

- Chemicals

- Defense

- Drug Delivery

- Education

- Electronics

- Energy

- Events

- Grants

- Industry

- Investment

- Litigation

- Materials

- MEMS

- Nanofabrication

- Nanoparticles

- Nanotubes

- Optics

- Partnership

- Patent

- Products

- Quantum dots

- Research

- Smart Dust

- Software
COMPANIES
EVENTS

- Browse by Month

- Current Shows

- Previous Shows

- Submit Events
FEEDBACK
ADVERTISE
LINK TO US

« PARTNERS »
Become A Nanotechwire Partner

FEI Company

Veeco Instruments

Nano Science and Technology Institute

National Nanotechnology Initiative

Nanotechnology at Zyvex

Want to see your Company or Organization listed above? Become A Nanotechwire Partner Today - click here
« NEWSLETTER »



« SEARCH »







FUJIFILM Electronic Materials U.S.A.
http://www.fujifilm-ffem.com/
FUJIFILM Electronic Materials U.S.A. Inc. is a wholly owned subsidiary of FUJIFILM Corporation, with regional headquarters in Japan, United States and Belgium and several manufacturing and R&D facilities located worldwide. The company supplies advanced technology chemistry and delivery equipment to the semiconductor and flat panel display fabrication market.

ASSOCIATED NEWS:
5/19/2011 12:57:50 PM | Partnership | 0 comments
FUJIFILM Joins SEMATECH’s Resist Center for Advanced EUV Resist Development at UAlbany NanoCollege
As a resist member of SEMATECH’s lithography program, FUJIFILM will collaborate with SEMATECH engineers on critical resist issues in extreme ultraviolet (EUV) lithography.
1/24/2010 9:00:01 PM | Electronics | 0 comments
FUJIFILM Barium-Ferrite Magnetic Tape Establishes World Record in Data Density: 29.5 Billion Bits Per Square Inch
Employing its advanced NANOCUBIC technology, Fujifilm succeeded in micro-particulation of the BaFe particle to 1600nm³, the equivalent of one-third of the current metal particle volume, uniformly dispersed and coated on a super smooth thin magnetic layer.
1/19/2008 8:07:29 AM | Products | 0 comments
FUJIFILM Invests in Next-Gen 45/32 nm Lithographic Tool
New Argon Fluoride-Based Immersion Exposure Tool Will Accelerate High-Res Photoresist Development for Next-Gen Semiconductors

« Back To List »

« GET LISTED »
- submit company
- submit news
- submit events
- advertise here

« EVENTS »
- More Events


Copyright © 2017 Nanotechwire.com | Privacy Policy |