CEA-Leti researchers will present two invited papers at the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics 2011 (IC-FCMN 2011), May 23-26 in Grenoble.
The 8th annual conference, which is being held for the first time outside the United States, will attract participants from around the world to examine the latest advances in characterization and metrology that will help shape the future of the nanoelectronics industry.
CEA-Leti’s presentations are among more than two-dozen invited papers. A Leti paper titled “State-of-the-art Semiconductor Characterization in an Aberration-corrected Transmission Electron Microscope” will show how a TEM has been used to develop and apply new techniques to characterize the latest generations of nanometer-scale devices.
The other Leti invited paper, “Hybrid Metrology and 3D-AFM Enhancement for CD Metrology Dedicated to 28nm Node-and-below Requirements,” discusses a new potential CD metrology solution called hybrid CD metrology that smartly tuned various morphological data coming from different CD metrology techniques.
IC-FCMN 2011, on the MINATEC Innovation Campus, will allow extended interaction between characterization and metrology experts and users from industry and R&D labs. The conference also will facilitate new research partnerships and help establish a common vision for meeting nanoelectronics characterization and metrology challenges.
For more information and registration, visit http://www.nist.gov/pml/semiconductor/conference/
CEA is a French research and technology organisation, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 190 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,700 patent families. For more information, visit http://www.leti.fr