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5/13/2011 11:57:10 AM
Ultratech Announces HB-LED Asia Technology Center in Taiwan

Ultratech, Inc., a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced its Asia Technology Center (ATC) in Taiwan. The integrated cleanroom provides the capability for leading-edge process development and in-depth demonstrations of Ultratech's Sapphire 100 lithography system, designed for customers in the emerging HB-LED market. To further support the company's Singapore international operations facility, announced last year, this center will enable cost-effective, leading-edge process development that can be transferred between sites or across Ultratech's large customer base throughout the Pacific Rim. Scheduled to open in the second half of 2011, the ATC furthers Ultratech's ongoing commitment to meet its international customers' needs with advanced technology solutions at the lowest cost-of-ownership.

Ultratech Chairman and CEO Arthur W. Zafiropoulo said, "With many of our customers located in the Pacific Rim, opening our Asia Technology Center in Taiwan enables us to work with leading companies to develop processes and lithography equipment advances to reduce the cost of manufacturing LEDs. In addition, the facility will be used to provide yield research as well as low-cost patterning solutions. Ultratech remains vigilant in its search for ways to provide low-cost solutions to support the significant growth in the HB-LED markets. We look forward to leveraging our Asia Technology Center to help speed the development of cost-effective lithography processes to support our customers' product and technology roadmaps for new and emerging markets."

Ultratech's Asia Technology Center (ATC) is located in Taiwan:

FL-1, No.26
Taiyuan Street, Chupei Li, Hsinchu City,
Hsinchu County
Taiwan 302, R.O.C.

Sapphire 100 Lithography System

Building upon the cost and performance advantages of the highly reliable 1500 platform, the next-generation Sapphire 100 system provides the best operational flexibility due to the fundamental benefits of the 1X lens design and market-specific technology options for high-volume, HB-LED manufacturing. The Sapphire 100 was specifically designed to meet the wide range of lithography needs and cost advantages for the HB-LED manufacturing industry.


Ultratech, Inc. (Nasdaq: UTEK) designs, manufactures and markets photolithography and laser processing equipment. Founded in 1979, the company's market-leading advanced lithography products deliver high throughput and production yields at a low, overall cost of ownership for bump packaging of integrated circuits and high-brightness LEDs (HB-LEDs). A pioneer of laser processing, Ultratech developed laser spike anneal technology, which increases device yield, improves transistor performance and enables the progression of Moore's Law for 45-nm and below production of state-of-the-art consumer electronics. Visit Ultratech online at:

Other Headlines from Ultratech ...
 - Ultratech Announces HB-LED Asia Technology Center in Taiwan
 - Ultratech Announces First Quarter 2011 Results
 - Ultratech Announces Fourth Quarter and Year-End 2010 Results
 - Ultratech Introduces Latest Generation Laser Annealing System for 28-nm Node and Beyond
 - Ultratech Introduces New Dual-Beam Laser Spike Anneal System

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