STMicroelectronics and CEA-Leti, the leading French semiconductor research institute, have signed an agreement for STMicroelectronics to join the new industry/research multi-partner program IMAGINE, led by CEA-Leti, which includes TSMC, for mask-less lithography for IC manufacturing. This three-year program is meant to allow companies to assess a maskless lithography infrastructure for IC manufacturing and the use of MAPPER* Technology for high-throughput. The multiple e-beam lithography program covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.
“STMicroelectronics has been working for more than a decade with CEA-Leti on maskless lithography. Together, ST and CEA-Leti have established a full shaped-beam capability on ST’s Crolles pilot line and demonstrated the insertion of e-beam technology in a standard CMOS process flow,” said Joël Hartmann Silicon-Technology Development Director for STMicroelectronics, at Crolles, France. “Joining the IMAGINE program is a logical step for ST to get access to a mask-less lithography possible solution for future technology nodes.”
“The IMAGINE program will benefit from the strong knowledge and support of STMicroelectronics in maskless technology,” said Leti’s CEO, Laurent Malier. “The experience of CEA-Leti in e-beam technology has been strengthened over the years by this partnership with ST for using e-beam for advanced technology demonstrators. With STMicroelectronics supporting the IMAGINE program, we are convinced we will succeed to make maskless lithography a viable solution.”
* MAPPER’s offices are located in Delft, The Netherlands, near Delft University of Technology; MAPPER is delivering massively parallel electron beam platforms and this equipment delivery is part of the collaboration program.
STMicroelectronics is a global leader serving customers across the spectrum of electronics applications with innovative semiconductor solutions. ST aims to be the undisputed leader in multimedia convergence and power applications leveraging its vast array of technologies, design expertise and combination of intellectual property portfolio, strategic partnerships and manufacturing strength. In 2008, the Company's net revenues were $9.84 billion. Further information on ST can be found at http://www.st.com.
CEA is a French research and technology organisation, with activities in three main areas: energy, technologies for information and healthcare, and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC excellence centre, Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, Leti puts a strong emphasis on intellectual property and owns more than 1,400 patent families. In STMicroelectronics Joins the CEA-Leti IMAGINE Program on Multiple E-Beam Lithography 2008, contractual income covered more than 75 percent of its budget worth 205 M€. For more information, visit http://www.leti.fr.
