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NEWS:

Wednesday, March 16, 2011 | Partnership | 0 comments
Accelrys and Oxford Nanopore Enter Software Partnership for DNA Sequencing Data Analysis
The partnership will help advance scientific innovation by simplifying and accelerating NGS analysis

Wednesday, March 16, 2011 | Partnership | 0 comments
Nanostart-held ItN Nanovation Signs Major Water Deal in Saudi Arabia
Water treatment throughput using company’s CFM Systems membranes significantly higher than with conventional filtration technologies

Monday, March 14, 2011 | Partnership | 0 comments
RUSNANO, Micran, Nokia Siemens Networks, and Tomsk Administration Sign Agreement to Manufacture 4G LTE Equipment
For RUSNANO, technology transfer to Russia, transfer of knowledge from one of the world’s leading telecommunications companies, makes this project especially interesting.

Monday, March 14, 2011 | Partnership | 0 comments
NanoSight adds Zeta Potential measurement capability to the most versatile tool for nanoparticle characterization
Zeta Potential Nanoparticle Tracking Analysis (Z-NTA) adds measurement of surface charge to simultaneous reporting of size, composition (light scattering intensity), fluorescence and count.

Monday, March 14, 2011 | Partnership | 0 comments
InfiniScale and CEA-Leti Collaboration To Focus on Process-Variability Management in SOI Sub-28nm Technology
The partnership will tap Leti’s design and technological expertise and provide InfiniScale access to Leti’s fully depleted silicon on insulator (FD SOI) technology to validate InfiniScale tools with measurements on silicon.

Monday, March 14, 2011 | Partnership | 0 comments
Siberian Branch of the Russian Academy of Sciences Joins Maryland International Incubator
The Academy plans partnerships in the areas such as nanotechnology, energy technology, applied chemistry and biotechnology.

Friday, March 11, 2011 | Partnership | 0 comments
Oxford Nanopore announces licence agreement with Harvard University for graphene DNA sequencing
Graphene is a robust, single atom thick 'honeycomb' lattice of carbon with high electrical conductivity. These properties make it an ideal material for high resolution, nanopore-based sequencing of single DNA molecules.

Wednesday, March 09, 2011 | Partnership | 0 comments
Hynix Semiconductor Joins SEMATECH’s 3D Interconnect Program at UAlbany NanoCollege
Collaborative effort to address critical infrastructure and technology gaps to drive wide I/O DRAM solutions

Monday, March 07, 2011 | Partnership | 0 comments
Cascade Microtech Partners with imec for 3D-TSV Probe Solutions
Technology leaders collaborate on 3D-TSV test infrastructure

Monday, March 07, 2011 | Partnership | 0 comments
Alcatel-Lucent Bell Labs, Thales and CEA-Leti Join Forces to Combine Unique Expertise in III-V Semiconductors and Silicon Technologies
Enlarged partnership in III-V Lab will target applications in telecoms, industrial control, environmental testing, defense, security and space

Tuesday, March 01, 2011 | Partnership | 0 comments
RUSNANO and The Dow Chemical Company sign memorandum of understanding
RUSNANO and The Dow Chemical Company through its wholly owned subsidiary Dow Europe GmbH have signed a memorandum of understanding to evaluate potential cooperation in fast-growing areas such as energy efficiency, infrastructure, light-weight materials, and life sciences.

Monday, February 28, 2011 | Partnership | 0 comments
Samsung Selects Veeco MOCVD System for Advanced GaN-Based Power Electronics Research
Veeco Instruments Inc. announced today that Samsung Advanced Institute of Technology (SAIT) in Korea has selected Veeco’s TurboDisc K465i Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) System for advanced GaN on Si research for power electronics.

Monday, February 28, 2011 | Partnership | 0 comments
CEA-Leti and its Startup ASELTA Create Joint Lab to Address Manufacturing Challenges of Mask and Direct-Write Lithography
CEA-Leti and ASELTA Nanographics, its newly incorporated startup, today announced they will jointly develop e-beam proximity effects correction solutions for both mask writing and maskless lithography (ML2) applications.

Monday, February 28, 2011 | Partnership | 0 comments
CEA-Leti: Magillem Design Services and CEA Sign Multi-Year Collaboration Agreement
Development of a Unified Hardware/Software Design Platform For Complex Systems-on-Chip

Thursday, February 10, 2011 | Partnership | 0 comments
RUSNANO and India’s SUN Group Sign Memorandum of Understanding
The memorandum states that RUSNANO and SUN Group will carry out joint analyses of nanotechnology applications in sectors of the economy where business prospects are most promising and that they will support the use of existing and yet-to-be developed nanotechnology products.

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