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NEWS:

Wednesday, August 06, 2008 | Products | 0 comments
SmartSilver Endorsed by Australian Wool Innovation to Protect Wool from Odor-Causing Microbes
The nanotechnology behind SmartSilver protection allows it to bond permanently to fibers so it never wears off or washes out and lasts the life of the fabric.

Wednesday, August 06, 2008 | Products | 0 comments
Nansulate Energy Saving Coatings Used for Government Sponsored Alternative Energy Efficient Housing Project in Western Australia
Nansulate PT thermal insulation and corrosion resistance coating has been incorporated into the first display home of a LandCorp alternative housing project in Seville Grove, Western Australia

Tuesday, August 05, 2008 | Products | 0 comments
Sniffing Out Trouble In Real Time
The Detection and Quantification of Airborne Substances via Real-Time On-Site Analysis is Now Possible With QualSec’s Nano-Nose

Monday, August 04, 2008 | Products | 0 comments
Upgraded “LIBRA 120 PLUS” TEM Features Flexibility Tuned to Customer Needs
Cryo option available. Workhorse instrument for all TEM applications.

Monday, August 04, 2008 | Products | 0 comments
Improved Helium Ion Microscope Sets New Standards for Imaging Resolution and Brightness
Carl Zeiss SMT introduces the ORION PLUS Helium Ion Microscope, with significant improvements that redefine what’s possible in high end microscopy

Friday, August 01, 2008 | Products | 0 comments
Nanogate coats Europe's largest city tunnel in Stockholm
In the city's Södra Länken tunnel system, which is about 16 km long in total, all of the exposed concrete is to be coated using Nanogate Technology.

Friday, August 01, 2008 | Products | 0 comments
First 8” MEMS Cluster Tool from Oerlikon on Its Way to Korea
The CLUSTERLINE is approved by major MEMS and Semiconductor manufacturers worldwide, featuring excellent process capabilities for production, not only for MEMS but also for UBM, BSM, TFH, IC and other compound applications

Wednesday, July 30, 2008 | Products | 0 comments
Ultratech Receives Multiple Orders From One of the Largest Memory Manufacturers in the World
Building on the success of its AP300 installed base, this customer will use Ultratech's lithography systems to expand capacity for advanced-packaging applications, such as chip stacking.

Wednesday, July 30, 2008 | Products | 0 comments
Carbon Nanoprobes Inc Books First Revenue From Large Chip Makers
Receives custom orders from leading semiconductor manufacturers, officially putting revenue on the company’s books

Tuesday, July 29, 2008 | Products | 0 comments
Veeco Receives Multi-Unit Order from Spectrolab to Support Capacity Increase
During the recently completed second quarter the Company received a multi-unit order for its TurboDisc K-475 As/P (arsenic phosphide) metal organic chemical vapor (MOCVD) deposition systems from Boeing Spectrolab Inc., the world's leading manufacturer of space solar cells and panels

Friday, July 25, 2008 | Products | 0 comments
Zetasizer Nano helps establish size independence in DNA driven nanoparticle structuring
A research team led by Dr Oleg Gang at the Brookhaven Center for Functional Nanomaterials (CFN) in New York is using the Zetasizer Nano particle characterization system from Malvern Instruments in ground-breaking work that has demonstrated successful DNA-guided formation of ordered 3-D crystalline structures.

Tuesday, July 22, 2008 | Products | 0 comments
Overhyped Technology Starts to Reach Potential: Nanotech to Impact $3.1 Trillion in Manufactured Goods in 2015
Lux Research report finds pervasive use of nanotechnology in manufactured products

Thursday, July 17, 2008 | Products | 0 comments
Measure Thickness and Composition of Thin Films with SEM EDS
Oxford Instruments NanoAnalysis introduces ThinFilmID for the in-situ measurement of composition and thickness of thin films down to 1nm in the SEM.

Thursday, July 17, 2008 | Products | 0 comments
ZEISS Revolutionary Helium Ion Microscope Wins Two More Prestigious Awards
ORION Helium Ion Microscope Wins Awards from Semiconductor International and R&D Magazines

Thursday, July 17, 2008 | Products | 0 comments
ASML Extends Immersion to the Limit of Single-Patterning Lithography
The system offers improved overlay, resolution and throughput, to enable high-volume manufacturing of more powerful 38 nanometer (nm) memory and ‘32' nm logic semiconductors.

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